| 분류 | 표면기술 |
|---|---|
| 기술명 | Surface Treatment by Using Plasma-enhanced Chemical Vapor Deposition at High Working Pressure |
| 연구자 | Jung-dae Kwon |
| 특허출원번호 | KR10-1004061 |
| 개요 | Technology and equipment to perform etching and functional thin film deposition at high speed by
generating highly intensive plasma at 0.1 to 1 pressure Proprietary technology to synthesize high performance silicon semiconductor thin films that can push the frontier of Si thin films for solar panels Protective film to improve the durability of the anti-reflection film |
| 첨부파일 |  099_Surface_Treatment_by_Using_Plasma-enhanced_Chemical_Vapor_Deposition_at_High_Working_Pressure.jpg (602.6K) [18] DATE : 2018-02-12 13:32:31 |
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